Optics: measuring and testing – Dimension
Reexamination Certificate
2006-11-15
2009-06-09
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Dimension
Reexamination Certificate
active
07545520
ABSTRACT:
A system and method for determining parameters such as critical dimension of a patterned structure and best focus condition of a lithographic apparatus, based on measurement of the intensity of a non-zero order of light diffracted from an experimental structure. The experimental structure includes a first array of lines and partially filled spaces having a period longer than the wavelength of the diffracted light. The experimental structure also includes a second array of lines and spaces, where the second array of lines and spaces comprise the partially filled spaces.
REFERENCES:
patent: 5361137 (1994-11-01), Aton et al.
patent: 2007/0105029 (2007-05-01), Ausschnitt
patent: 2007/0114678 (2007-05-01), Van Haren et al.
patent: 2007/0132996 (2007-06-01), Van Haren et al.
Philippe Lalanne, et al., “Antireflection behavior of silicon subwavelength periodic structures for visible light”, Nanotechnology 8, pp. 53-56 (1997).
Gaspar-Wilson et al., “Metrology of Etched Quartz and Chrome Embedded Phase Shift Gratings Using Scatterometry,” Integrated Circuit Metrology, Inspection and Process Control IX, Proc. SPIE vol. 2439, Feb. 20-22, 1995, pp. 479-494.
Milner et al., “Stepper Focus Characterization Using Diffraction from Latent Images,” Journal of Vacuum Science and Technology B, 2ndSeries, vol. 11, No. 4, pp. 1258-1266, Jul. 1993.
Hickman et al., “Use of Diffraction from Latent Images to Improve Lithography Control,” Journal of Vacuum Science and Technology B, 2ndSeries, vol. 10, No. 5, pp. 2259-2266, Sep. 1992.
Lee Hyun-Woo
Musa Sami
ASML Netherlands B.V.
Chowdhury Tarifur
Cook Jonathan D
Sterne Kessler Goldstein & Fox P.L.L.C.
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