Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2007-12-11
2007-12-11
Norris, Jeremy C (Department: 2841)
Metal working
Method of mechanical manufacture
Electrical device making
C029S854000
Reexamination Certificate
active
10924629
ABSTRACT:
Power supplied to an information handling system electronic component through a circuit board has component package inductance parasitic effects compensated by configuring connections to the electronic component to have increased parasitic capacitance. For instance, power and ground vias that connect a processor to power and ground planes of the circuit board are aligned to create a desired parasitic capacitance that reduces the impact of parasitic inductance relating to signal compensation, power delivery and high speed decoupling. The desired distributed capacitance is modeled by altering the radius associated with the equivalent line charge of the power via, the distance associated with the line charges between power and ground vias, and the via barrel length.
REFERENCES:
patent: 5636099 (1997-06-01), Sugawara et al.
patent: 5761049 (1998-06-01), Yoshidome et al.
patent: 5973929 (1999-10-01), Arakawa et al.
patent: 6252177 (2001-06-01), Stoddard
patent: 6661316 (2003-12-01), Hreish et al.
patent: 6791429 (2004-09-01), Mikalauskas
patent: 6961231 (2005-11-01), Alexander et al.
patent: 2006/0043987 (2006-03-01), Van Horn et al.
patent: 2006/0225916 (2006-10-01), Nelson et al.
Teshome Abeye
Zhang Lan
Dell Products L.P.
Hamilton & Terrile LLP
Holland Robert W.
Norris Jeremy C
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