Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2004-01-29
2009-08-25
Mehta, Bhavesh M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S286000, C430S030000, C359S290000
Reexamination Certificate
active
07580559
ABSTRACT:
A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an apodized pupil. During a calibration operation, the pixels of the SLM receive varying voltage values to move them through various angles. Light reflecting from the pixels during these movements forms individual images for each pixel at each angle. The light passes through the apodized pupil and is received on one or more sections of a detector. The apodization pattern is selected so that individual pixels remain well resolved with strong sensitivity to the pixel mirror tilt. The light intensity received for each pixel at each angle is correlated to the voltage value received at the pixel to tilt the pixel to that angle producing a result signal used by a control device to calibrate the SLM.
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English Abstract for Publication No. JP2000-293885A published Oct. 20, 2000 (retrieved from the esp@cenet database).
Translation for Office Action and Office Action for Japanese Patent Application No. 2005-024275 mailed Mar. 4, 2008, 8 pgs.
Latypov Azat M.
Poultney Sherman K.
ASML Holding N.V.
Mehta Bhavesh M
Rashid David P
Sterne Kessler Goldstein & Fox P.L.L.C.
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