System and method for buffing and polishing fingernails and toen

Toilet – Nail device – Abrader – file or buffer

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

132200, 51392, A45D 2918

Patent

active

057822476

ABSTRACT:
An improved system and method for buffing and polishing fingernails and toenails. The improved nail care system includes at least two fabric strips. Each fabric strip has two surfaces with at least one of the two surfaces covered with a graded abrasive. A first fabric strip is covered with a coarsely graded abrasive. A second fabric strip is covered with a finely graded abrasive. The improved method for buffing and polishing fingernails and toenails includes cleaning the nail, buffing the nail with a 1500 to 2400 grit abrasive for 15 to 30 seconds once during a first predetermined number of days, e.g. thirty days, further buffing the nail with a 2400 to 4500 grit abrasive for 15 to 30 seconds once during the first predetermined number of days, polishing the nail with a 4500 to 12000 grit abrasive for 15 to 30 seconds once during a second predetermined number of days, e.g. seven days, and further polishing the nail with a 12000 or greater grit abrasive for 15 to 30 seconds once during the second predetermined number of days.

REFERENCES:
patent: 2450207 (1948-09-01), Silverman
patent: 2551700 (1951-05-01), Pinco
patent: 2953141 (1960-09-01), Bader, Jr.
patent: 3706316 (1972-12-01), Ishii
patent: 3866618 (1975-02-01), Tsukamoto
patent: 4381792 (1983-05-01), Busch, Jr. et al.
patent: 4712552 (1987-12-01), Pangburn
patent: 4716948 (1988-01-01), Brissette
patent: 5088509 (1992-02-01), Savage, III
patent: 5176155 (1993-01-01), Rudolph, Jr.
patent: 5287863 (1994-02-01), La Joie et al.
patent: 5358115 (1994-10-01), Pietsch et al.
patent: 5374975 (1994-12-01), Amat
patent: 5666981 (1997-09-01), Stephens

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for buffing and polishing fingernails and toen does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for buffing and polishing fingernails and toen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for buffing and polishing fingernails and toen will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1638665

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.