System and method for analyzing wavefront aberrations

Optics: eye examining – vision testing and correcting – Eye examining or testing instrument – Methods of use

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07954950

ABSTRACT:
A system and method for specifying a vision correction prescription for a patient's eye, wherein in one embodiment, the method includes obtaining a wavefront aberration measurement of the patient's eye, applying at least one value from the wavefront aberration measurement to a statistical model trained using a plurality of objectively measured aberration values and a plurality subjectively measured visual acuity values as training data; and predicting a vision correction prescription for the patient's eye based on the at least one value and the statistical model.

REFERENCES:
patent: 6761454 (2004-07-01), Lai et al.
patent: 6781681 (2004-08-01), Horwitz
patent: 6786602 (2004-09-01), Abitbol
patent: 7771048 (2010-08-01), Dai et al.
patent: 2003/0133074 (2003-07-01), Pettit et al.
patent: 2003/0133075 (2003-07-01), Sheets et al.
patent: 2004/0054358 (2004-03-01), Cox et al.
patent: 2004/0263786 (2004-12-01), Williams et al.
patent: 1 327 948 (2003-07-01), None
patent: 1 327 949 (2003-07-01), None
patent: 2003-245299 (2003-09-01), None
patent: 2003-245301 (2003-09-01), None
patent: WO-01/89424 (2001-11-01), None
patent: WO-02/088830 (2002-11-01), None
patent: WO-03/050594 (2003-06-01), None
patent: WO-03/082162 (2003-10-01), None
patent: WO-2004/072709 (2004-08-01), None
Supplementary European Search Report for EP 05723711.7, mailed Jul. 10, 2009, 3 pages.
Dreiseitl and Ohno-Machado, Journal of Biomedical Informatics (2002) 35:352-359.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for analyzing wavefront aberrations does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for analyzing wavefront aberrations, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for analyzing wavefront aberrations will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2637399

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.