System and apparatus for photolithography

Details System and apparatus for photolithography System and apparatus for photolithography

2006-04-11

2006-04-11

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07027125

ABSTRACT:
A photolithographic apparatus, system and method employing an improved refractive medium. The photolithographic apparatus may be used in an immersion lithography system for projecting light onto a workpiece such as a semiconductor wafer. In one embodiment, the photolithographic apparatus includes a container containing a transparent fluid. The fluid container is positioned between a lens element and the wafer. The container is further characterized as having a substantially flexible and transparent bottom membrane contacting an upper surface of the wafer and overlapping at least one side edge of the wafer such that a fluid filled skirt is formed extending beyond the edges of the wafer.

REFERENCES:
patent: WO 2004/093159 (2004-10-01), None
U.S. Appl. No. 10/707,894, filed on Jan. 21, 2004, entitled “Liquid-Filled Balloons for Immersion Lithography,” by Mark C. Hakey et al.

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