System and a method for improved crosshatch nanomachining of...

Details System and a method for improved crosshatch nanomachining of... System and a method for improved crosshatch nanomachining of...

2011-08-23

2011-08-23

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C850S033000, C850S034000

Reexamination Certificate

active

08003283

ABSTRACT:
This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material. Therefore, embodiments of the present invention minimizes tip deflection errors allowing allow high aspect Nano-bits to reliably and accurately nanomachine small high aspect three dimensional structures to repair and rejuvenate photomasks.

REFERENCES:
patent: 2003/0020025 (2003-01-01), Nakayama et al.
patent: 2009/0038383 (2009-02-01), Nakaue et al.

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