Synthetic silica glass article for dopant-diffusion process in s

Compositions: ceramic – Ceramic compositions – Glass compositions – compositions containing glass other than...

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428426, 501 11, 501 12, 501 53, C03C 306

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050631810

ABSTRACT:
The invention provides a synthetic silica glass article or tool for a dopant-diffusing process in semiconductors, which is quite satisfactory in use in respect of the outstandingly small creeping at high temperatures, by working from a silica glass block having such a creeping characteristic that the elongation under a tension of 62.5 g/mm.sup.2 at a temperature of 1250.degree. C. does not exceed 0.025% after 5 minutes.

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