Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component
Reexamination Certificate
2005-12-30
2010-11-16
Allen, Stephone B (Department: 2872)
Optical: systems and elements
Having significant infrared or ultraviolet property
Lens, lens system or component
C252S584000, C252S588000
Reexamination Certificate
active
07835070
ABSTRACT:
An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae satisfying either grade 1 or grade 2 (Japan Optical Glass Industry Society Standard), an absorption coefficient α at 3585 cm−1equal to or below 0.035/cm, and the content of aluminum and lithium being equal to or below 1 and 0.5 ppm, respectively.
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Allen Stephone B
Chapel Derek S
Nikon Corporation
Oliff & Berridg,e PLC
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