Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1974-02-21
1976-05-04
Edmundson, F. C.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
204169, 250542, 260429R, 2604291, 2604297, 260448A, 260607R, B01K 100, C07F 500, C07F 700, C07F 1700
Patent
active
039545857
ABSTRACT:
Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.
REFERENCES:
patent: 3068510 (1962-12-01), Coleman
patent: 3081245 (1963-03-01), Farlow
patent: 3240691 (1966-03-01), Mastrangelo
patent: 3317618 (1967-05-01), Haszeldine
patent: 3397132 (1968-08-01), Wolinski
patent: 3674667 (1972-04-01), Manion
Advances in Organometallic Chemistry, Vol. 1, p. 165, by Stone et al., Pub. by Academic Press, N.Y., 1964.
Jacob et al., Jr. Chem. Soc. Chem. Comm., 1973 (4), pp. 104 and 105, Pub. Feb. 21, 1973.
Gerchman Lois L.
Jacob Robert A.
Lagow Richard J.
Cook Paul J.
Edmundson F. C.
Massachusetts Institute of Technology
Santa Martin M.
Smith, Jr. Arthur A.
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