Synthesis of titanium nitride films

Coating processes – Electrical product produced – Transparent base

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4271261, 4271262, 427226, 427240, 427343, 427377, 427380, B05D 512, B05D 312, B05D 302

Patent

active

052021521

ABSTRACT:
A substantially stoichiometric film of titanium nitride is provided by heating a substrate upon which a solution containing titanium has been applied at a substantially ambient temperature to provide a gel-film containing titanium on the surface of the substrate in an ammonia atmosphere. The substrate is heated to a temperature at which the titanium in the titanium-containing gel-film is substantially completely transformed to a substantially stoichiometric titanium nitride film, and at a rate of temperature change that is great enough to prevent the formation of nonstoichiometric titanium nitride compounds or other undesired titanium compounds in the resulting titanium nitride film. The invention is particularly suited for use in microelectronic devices.

REFERENCES:
patent: 3036888 (1962-05-01), Lowe
patent: 4151325 (1979-04-01), Welch
patent: 4361598 (1982-11-01), Yoldas
patent: 4535000 (1985-08-01), Gordon
patent: 4675073 (1987-06-01), Douglas
patent: 4704299 (1987-11-01), Wielonski et al.
patent: 4812333 (1989-05-01), Micheli
patent: 4830879 (1989-05-01), Debsikdar
patent: 4842888 (1989-06-01), Halluska et al.
patent: 4885188 (1989-12-01), Hawegawa et al.
patent: 4906493 (1990-05-01), Laine
patent: 4948762 (1990-08-01), Krumbe et al.
patent: 4966812 (1990-10-01), Ashley et al.
patent: 4970095 (1990-11-01), Bolt et al.
"Nitridation of the Sol-Gel-Derived Titanium Oxide Films by Heating in Ammonia Gas"; Kanichi Kamiya and Tomoaki Nishijima; J. Am Ceram. Soc., 73 [9] 2750-52 (1990).
"Preparation of Titanium Nitride and Titanium Carbonitride by the Preceramic Polymer Route"; Dietmar Seyferth and Gerard Mignani; Journal of Materials Science Letters 7 (1988) 487-488.
"Nitriding of Bulk Titanium and Thin Titanium Films in a NH.sub.3 Low Pressure Plasma"; N. Laidani, et al.; Applied Surface Science, vol. 36, No. 1-4, pp. 520-529, Jan. 1989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Synthesis of titanium nitride films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Synthesis of titanium nitride films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Synthesis of titanium nitride films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1154092

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.