Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent
1984-03-08
1986-06-24
Hollrah, Glennon H.
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
544 73, 544 63, 546153, 546290, 546347, 548542, 564271, 564278, 564248, 564272, 564275, C07D49804, C07D21194, C07D20746, C07D21560, C07D21710
Patent
active
045968748
ABSTRACT:
A nitrone is synthesized from a secondary amine by reacting a compound represented by the following general formula ##STR1## wherein R.sup.1 and R.sup.2 mean individually a hydrogen atom or an alkyl or aryl group and R.sup.3 denotes an alkyl or aryl group with a peroxide in the presence of a catalyst selected from the group consisting of tungsten compounds, molybdenum compounds, vanadium compounds, titanium compounds, palladium compounds, rhodium compounds, ruthenium compounds and nickel compounds. This process provides the nitrone by one-step oxidation of the secondary amine.
REFERENCES:
patent: 3467711 (1969-09-01), Bader et al.
patent: 3494924 (1970-02-01), Bonetti et al.
Murahashi et al., Rx of N and N,N Subst. by Dioxylamines with Pd Catalyst. Pergamon Press/Tetrahed. Letters, vol. 24, No. 10, 1049-1052.
Ginsberg, Concerning Amines, Pergamon Press, 1967, pp. 87-88.
Allinger et al., Organic Chemistry, Worth Publishers 1971, pp. 575-576.
House, Modern Synthetic Reactions, 2nd Edition, Benjamin/Cummings Co., CA (1972), pp. 330-335.
Mitsui Hitoshi
Murahashi Shun-Ichi
Adams Bruce L.
Burns Robert E.
Dinner Dara L.
Hollrah Glennon H.
Lobato Emmanuel J.
LandOfFree
Synthesis of nitrone from secondary amine does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Synthesis of nitrone from secondary amine, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Synthesis of nitrone from secondary amine will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2085894