Synthesis of crystalline ultra-large pore oxide materials

Details Synthesis of crystalline ultra-large pore oxide materials Synthesis of crystalline ultra-large pore oxide materials

1992-10-13

1994-05-03

McFarlane, Anthony

Chemistry of inorganic compounds

Zeolite

Organic compound used to form zeolite

423704, 4233282, 502 64, C01B 3326

Patent

active

053086023

ABSTRACT:
There is provided a method for preparing crystalline ultra-large pore oxide materials. The materials are formed from reaction mixtures comprising an amphiphilic compound, such as a cetyltrimethylammonium compound, a source of at least one oxide, such as silica, and water. The concentration of amphiphilic compounds in these reaction mixtures is rather low. The addition of an inorganic salt, such as sodium bromide, to the reaction mixture may result in the increased thermal stability of the as-synthesized form of the crystalline material and may also alter the crystalline phase of the product.

REFERENCES:
patent: 3567372 (1971-03-01), Duecker et al.
patent: 4859648 (1989-08-01), Landis et al.
patent: 5057296 (1991-10-01), Beck
patent: 5098684 (1992-03-01), Kresge et al.
patent: 5102643 (1992-04-01), Kresge et al.
patent: 5110572 (1992-05-01), Calabro et al.
patent: 5156829 (1992-10-01), McCullen et al.
Davis, M., et al., "A Molecular sieve with eighteen-membered rings," Nature, vol. 331, 698-699 (1988).
Davis, M., et al., "VPI-5: The first molecular sieve with pores larger than 10 Angstroms," Zeolites, vol. 8, 362-366 (1988).
Breck, D., Zeolite Molecular Sieves, 272-273, 376 (1974).

Affiliated with

Also associated with

Rating

Synthesis of crystalline ultra-large pore oxide materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Synthesis of crystalline ultra-large pore oxide materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Synthesis of crystalline ultra-large pore oxide materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2113176