Symmetric magnetic doublet for charged particle beam lithography

Details Symmetric magnetic doublet for charged particle beam lithography Symmetric magnetic doublet for charged particle beam lithography

1998-03-13

1999-07-27

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

H01J 3730

Patent

active

059294515

ABSTRACT:
Symmetric magnetic doublets are disclosed that image a reticle onto a sensitized substrate using a charged-particle beam. The symmetric magnetic doublet comprises an object-side lens and an image-side lens and satisfies certain quantitative conditions. If the object-side lens has a length S.sub.1 and pole-piece apertures of radii R.sub.1, R.sub.2, and the image-side lens has a length S.sub.2 and pole-piece apertures of radii R.sub.3, R.sub.4, then a lens according to an embodiment of the invention produces a demagnification of 1/m in an object-image distance L between the reticle and the substrate. This embodiment satisfies the relations R.sub.3 =R.sub.2 /m, R.sub.4 =R.sub.1 /m, S.sub.2 =S.sub.1 /m, and ##EQU1##

REFERENCES:
patent: 5773837 (1998-06-01), Nakasuji
Heritage, "Electron-Projection Microfabrication System," J. Vac. Sci. Technol., vol. 12, No. 6, pp. 1135-1140 (Nov./Dec. 1975).

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