Coating apparatus – With means to apply electrical and/or radiant energy to work... – Radiant heating
Patent
1989-04-17
1991-02-19
Woo, Jay H.
Coating apparatus
With means to apply electrical and/or radiant energy to work...
Radiant heating
118666, 118696, 118730, 427 55, B05C 1100, B05C 1300, C23C 1652
Patent
active
049933558
ABSTRACT:
A rotatable substrate supporting mechanism for use in a chemical vapor deposition reaction chamber of the type used in producing semi-conductor devices is provided with a susceptor for supporting a single substrate, or wafer, for rotation about an axis normal to the center of the wafer. The mechanism is provided with a temperature sensing system for producing signals indicative of sensed temperatures taken at the center of the susceptor and at various points about the periphery thereof. A gas purging system is provided for inhibiting the flow of reactant gas in unwanted areas of the reaction chamber and in the supporting system itself. Rotational driving of the mechanism is accomplished by a variable speed motor under control of a circuit which stops and starts the rotation at controlled speeds and stops the rotation at a home position for enhancing the handling of the wafers.
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deBoer Wiebe B.
Ozias Albert E.
Epsilon Technology Inc.
Nguyen Khanh P.
Woo Jay H.
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