Susceptor for a gas phase growth apparatus

Coating apparatus – Work holders – or handling devices

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Details

118728, 118730, C23C 1600

Patent

active

057857644

ABSTRACT:
A susceptor 1 for a gas phase growth apparatus to which a round depressed pocket 2 with a bottom a side wall is formed for the placing of a semiconductor wafer 3 wherein a protuberance 6 is provided on the circumference of the pocket at and near the position ere said semiconductor wafer touches said side wall 4 of the pocket 2 in such a way that the protuberance 6 covers a part of a chamfered area of said semiconductor wafer 3 without touching it. Thus cracks and breakage due to adhesion between a susceptor and a wafer may be prevented.

REFERENCES:
patent: 4735701 (1988-04-01), Allen
patent: 5147168 (1992-09-01), Suwa
patent: 5439523 (1995-08-01), Yamaguchi

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