Susceptor apparatus for epitaxial deposition and method for redu

Details Susceptor apparatus for epitaxial deposition and method for redu Susceptor apparatus for epitaxial deposition and method for redu

1997-10-10

1999-10-19

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

Work support

118500, C23C 1600

Patent

active

059682779

ABSTRACT:
Described are apparatus and method for providing relief in a center bottom region of each of a plurality of recessed pockets for supporting a semiconductor substrates during epitaxial deposition. In a preferred embodiment, the relief takes the form of a rectilinear recess, or cutout, formed along the bottom periphery of each pocket to change the single-point, tangential contact to a double-point contact that stabilizes the substrate supported thereon and that reduces slip formation characterizing conventional, unrelieved pockets formed in barrel-type reactors such as susceptors. The invention lends itself to design and manufacture of such reactors as well as retrofit of an existing installed base of conventional reactors.

REFERENCES:
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4322592 (1982-03-01), Martin
patent: 4579080 (1986-04-01), Martin et al.
patent: 4823736 (1989-04-01), Post et al.
patent: 5121531 (1992-06-01), Severns et al.
patent: 5820686 (1998-10-01), Moore
Prior art fig 2.0.

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