Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1996-07-23
1998-06-09
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430449, 430634, 252312, 252354, 560 14, 560151, G03C 138, G03C 7388, C07C14367, C07C14920
Patent
active
057631506
ABSTRACT:
Surfactants useful as dispersing aids in the preparation of compositions comprising a hydrophilic colloid having hydrophobic particles dispersed therein have the structure ##STR1## wherein M is a cation;
REFERENCES:
patent: 2785134 (1957-03-01), Mathews et al.
patent: 2785135 (1957-03-01), Mathews et al.
patent: 2949360 (1960-08-01), Julian
patent: 3755217 (1973-08-01), Schrader
patent: 3948663 (1976-04-01), Shiba et al.
patent: 4058543 (1977-11-01), Mack
patent: 4347308 (1982-08-01), Takeuchi et al.
patent: 4988610 (1991-01-01), Pitt et al.
patent: 5135844 (1992-08-01), Bagchi et al.
patent: 5380628 (1995-01-01), Sawyer et al.
patent: 5484695 (1996-01-01), Pitt et al.
patent: 5543555 (1996-08-01), Pitt et al.
patent: 5565309 (1996-10-01), Bagchi et al.
Research Disclosure, Dec. 1989; vol. 308; No. 119; pp. 993-1015.
Gibson Danuta
Pitt Alan Robert
Wear Trevor John
Anderson Andrew J.
Eastman Kodak Company
Schilling Richard L.
LandOfFree
Surfactants and hydrophilic colloid compositions and materials c does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Surfactants and hydrophilic colloid compositions and materials c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Surfactants and hydrophilic colloid compositions and materials c will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2197514