Surfactant in precoat for lithographic plates

Details Surfactant in precoat for lithographic plates Surfactant in precoat for lithographic plates

1997-10-06

1999-05-04

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430155, 430157, 430158, 430166, 4302711, G03C 193, G03F 7021

Patent

active

059003456

ABSTRACT:
Improved aluminum substrates suitable for use in the production of lithographic printing plates. A surfactant surface treatment for such aluminum substrates improves the quality of radiation sensitive coatings subsequently applied to the substrate. The surfactant may be in a layer comprising a mixture of a hydrophilizing composition and a surfactant on the aluminum alloy surface; or a hydrophilizing layer comprising a hydrophilizing composition may be on the aluminum alloy surface and a surfactant layer comprising a surfactant on the hydrophilizing layer.

REFERENCES:
patent: 3860426 (1975-01-01), Cunningham et al.
patent: 4631245 (1986-12-01), Pawlowski
patent: 4640886 (1987-02-01), Miller et al.
patent: 4983497 (1991-01-01), Gilson et al.
patent: 5328797 (1994-07-01), Neubauer et al.
patent: 5543261 (1996-08-01), Vermeersch et al.
patent: 5543262 (1996-08-01), Sypek et al.
patent: 5637435 (1997-06-01), Shimizu
patent: 5639586 (1997-06-01), Hauquier et al.

Affiliated with

Also associated with

Rating

Surfactant in precoat for lithographic plates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Surfactant in precoat for lithographic plates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Surfactant in precoat for lithographic plates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1869314