Electric lamp and discharge devices: systems – Combined load device or load device temperature modifying... – Distributed parameter resonator-type magnetron
Patent
1986-07-02
1989-03-07
Boudreau, Leo H.
Electric lamp and discharge devices: systems
Combined load device or load device temperature modifying...
Distributed parameter resonator-type magnetron
31323131, 313485, 313493, 31511121, 315248, 333 24C, 333 99PL, 333 32, 333232, 219 1055R, H01J 1104, H01J 6504, H01P 120
Patent
active
048109339
ABSTRACT:
The present invention relates to a device for generating plasma (ionizing gas) by a propagating surface wave. The device comprises a wave launching structure mounted on a plasma vessel and connected to an impedance matching network. The latter comprises a coupler and a tuner which is either formed by a section of a transmission line or is of the lumped circuitry type. The launching structure may either generate an azimuthally symmetric or a non symmetric propagating wave. This invention also relates to a method and a device for shaping plasma which comprises a plasma vessel receiving a surface wave generator and having a serviceable portion of a size and/or shape substantially different from the shape and/or size of the portion of the plasma vessel receiving the wave generator.
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IEEE Transactions on Plasma Science, vol. PS-3, No. 2, Jun. 1975, "A Small Microwave Plasma Source for Long Column Production Without Magnetic Field", Michael Moisan, Claude Beaudry and Philippe Leprince.
Moisan Michel
Zakrzewski Zenon
Boudreau Leo H.
Powell Mark R.
Universite de Montreal
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