Optics: measuring and testing – By polarized light examination – With light attenuation
Patent
1992-07-14
1994-05-03
Warden, Robert J.
Optics: measuring and testing
By polarized light examination
With light attenuation
356376, G01B 1124, G01B 1130
Patent
active
053092228
ABSTRACT:
A surface undulation inspection apparatus for detecting a defect of a fine undulation including a change of a gentle profile or the like on a suitable surface of a specimen to be inspected, wherein a patterning light source is opposed to an image pickup lens having a pin hole with a specimen interposed therebetween to pin-hole image pickup the patterning light source through the specimen to be inspected whereby a ray passing through the specimen to be inspected is specified as a principal ray, and a local surface undulation defect on the surface of the specimen is stressed and a defective part is specified. Further, a display pattern generated by a pattern generator is displayed on a pattern display element to used it as a patterning light source, the pattern generator is feedback controlled by a deviation calculation circuit, a standard data generator circuit, a pattern width coincidence decision circuit and a comparison data circuit, or a coordinate conversion circuit and an angle detector circuit, and an intensity of the display pattern is regularly changed in an analog manner to detect an abnormality on the basis of a differential from the image data.
REFERENCES:
patent: 3804521 (1974-04-01), Sprague
patent: 4212073 (1980-07-01), Balasubramanian
patent: 4215939 (1980-08-01), Miller et al.
patent: 4794550 (1988-12-01), Grienkamp, Jr.
patent: 5003615 (1991-03-01), Sutz
patent: 5024529 (1991-06-01), Svetkoff et al.
patent: 5102223 (1992-04-01), Uesugi et al.
Kamei Mitsuhito
Tachibana Mikio
Crawford L. M.
Mitsubishi Denki & Kabushiki Kaisha
Warden Robert J.
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