Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2008-09-25
2011-11-29
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C216S099000, C216S103000, C438S753000
Reexamination Certificate
active
08066898
ABSTRACT:
A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.
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A study of the tchant for FPD Glass Substrate.
Kikuyama Hirohisa
Miyashita Masayuki
Ohmi Tadahiro
Yabune Tatsuhiro
Stella Chemifa Kabushiki Kaisha
Vinh Lan
Young & Thompson
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