Surface treatment of antireflective layer in chemical vapor depo

Details Surface treatment of antireflective layer in chemical vapor depo Surface treatment of antireflective layer in chemical vapor depo

1998-06-04

2000-04-18

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427167, 42725527, 4272554, 4272557, B05D 306, C23C 1630

Patent

active

060512822

ABSTRACT:
In a chemical vapor deposition process a surface layer is formed on an antireflective layer to prevent amines in the antireflective layer from neutralizing acid components formed during the exposure of an overlying photoresist layer. The surface layer is formed by introducing an oxygen-containing gas such as N.sub.2 O into the CVD chamber in the presence of radio frequency power, after the antireflective layer has been formed.

REFERENCES:
patent: 5710067 (1998-01-01), Foot et al.
T. Ogawa et al., "Practicle Resolution Enhancement Effect by New Complete Anti-Reflective Layer in KrF Excimer Laser Lithography", SPIE vol. 1927 Optical/Laser Microlithography VI, 1993, pp. 263-274.
T. Perera, "Antireflective Coatings--an Overview", Jul. 1995, Solid State Technology, pp. 131-136.

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