Surface treatment of a molybdenum screening mask

Details Surface treatment of a molybdenum screening mask Surface treatment of a molybdenum screening mask

1985-04-25

1986-07-29

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, B05D 306

Patent

active

046030565

ABSTRACT:
Disclosed is a method of treating the surface of a molybdenum mask used for screening a metallized paste pattern to render it smooth and preserve the mask's hardness. The treatment consists of subjecting the mask to a nitridation step by which an ultrathin layer of molybdenum layer is first formed, followed by deposition of a comparatively thick silicon nitride layer thereon. The nitridation step may be accomplished in a plasma deposition system using either forming gas, ammonia or gas mixture of nitrogen and ammonia at a predetermined low temperature and pressure. The silicon nitride deposition may be accomplished in the same system at the same temperature and pressure by substituting the gas utilized to form the molybdenum nitride with a gaseous mixture of silane and one of nitrogen and ammonia.

REFERENCES:
patent: 3757733 (1973-09-01), Reinberg
patent: 3764379 (1973-10-01), Tuttle
patent: 4342617 (1982-08-01), Fu et al.
patent: 4420498 (1983-12-01), Hirose et al.
patent: 4429011 (1984-01-01), Kim et al.
W. Burger et al., "Multi-Layer Ceramics Manufacturing", IBM J. Res. Develop., vol. 27, No. 1, Jan. 1983, pp. 11-19.
H. Okabayashi et al., "A Mo-Nitride/Mo Gate MOS Structure", Abstract No. 302, Extended Abstracts of ECS, Spring Meeting, May 10-15, 1981, pp. 753-754.

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