Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material
Patent
1989-02-28
1990-04-24
Hoag, Willard
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to condition of coating material
118429, B05C 102
Patent
active
049190733
ABSTRACT:
Treatment baths for surface treatment of semiconductor wafers by dipping thereof into a treatment liquid are arranged in a treatment bath train.
One or more selected treatment baths among these treatment baths are constructed to have a plurality of unit treatment vessels. The treatment liquid in these treatment vessels is replaced successively one by one of the unit treatment vessels. The semiconductor wafers are dipped in the treatment liquid contained in that unit treatment vessel that is not being subjected at that moment to the replacement of the treatment liquid.
REFERENCES:
patent: 2386079 (1945-10-01), Weiskopf
patent: 3165108 (1965-01-01), Elliott et al.
patent: 3401065 (1968-09-01), Steinbrecher et al.
patent: 3604939 (1971-09-01), Maksymiak
patent: 3653808 (1972-04-01), Ishizawa et al.
patent: 3730667 (1973-05-01), Tani et al.
patent: 3986518 (1976-10-01), Sato
patent: 4374681 (1983-02-01), Schueneman
patent: 4377986 (1983-03-01), Juve
patent: 4406248 (1983-09-01), Araki et al.
patent: 4511448 (1985-04-01), Tanaka et al.
patent: 4568576 (1986-02-01), Minnie et al.
patent: 4674440 (1987-06-01), Cardin et al.
Akao Kiyoshi
Kobayashi Atsuo
Yamada Takuma
Dainippon Screen Mfg. Co,. Ltd.
Hoag Willard
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