Surface treatment method and apparatus therefor

Details Surface treatment method and apparatus therefor Surface treatment method and apparatus therefor

1989-08-25

1990-10-30

Hoag, Willard

Coating apparatus

Program, cyclic, or time control

Having selection means for alternate operational sequences

B05C 302

Patent

active

049660942

ABSTRACT:
Time periods required for dipping semiconductor wafers in a treatment liquid in a treatment bath and for replacing the treatment liquid etc. are previously stored in a memory. Based on these data, the expected clock time when the semiconductor wafers reach each treatment bath is calculated and the replacement of the treatment liquid and transportation of the wafers are controlled on the basis of these data and the expected clock time.

REFERENCES:
patent: 3762362 (1973-10-01), Lipshaw
patent: 3889014 (1975-06-01), Kinney et al.
patent: 4060052 (1977-11-01), Algeri et al.
patent: 4374681 (1983-02-01), Schueneman
patent: 4483271 (1984-11-01), Eidschun et al.

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