Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1999-02-01
2000-05-16
Gulakowski, Randy
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 26, 438115, 438906, H01L 2100, C23F 100
Patent
active
060632070
ABSTRACT:
A surface treatment method for bonding pad is described, in which a passivation layer is formed on a bonding pad and an opening is formed within the passivation by a plasma etching process. The bonding pad is corroded by the etching plasma containing fluorine during the etching process. The bonding pad is rinsed with deionized water comprising carbon dioxide to reduce the effects of the corrosion phenomenon.
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Chou Ta-Cheng
Yu Chia-Chieh
Ahmed Shamim
Gulakowski Randy
Huang Jiawei
United Semiconductor Corp.
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