Surface treatment device

Coating apparatus – With heat exchange – drying – or non-coating gas or vapor...

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Details

118425, 118426, 118428, 118429, 134 66, 134165, B05C 304, B05C 310

Patent

active

042828252

ABSTRACT:
A surface treatment device capable of carrying out the surface treatment such as washing or etching of plate-like articles such as semiconductor wafers maintaining high degree of reliability, wherein a surface treating liquid is introduced into a ring-like or a conduit-like treating vessel. The plate-like articles to be treated are moved by a conveyor on a conveyor path having a surface in parallel with the surfaces of the plate-like articles against the stream of the treating liquid in a piece-by-piece manner, so that the surfaces of the plate-like articles are treated, whereby the surfaces of the semiconductor wafers can be desirably treated prior to manufacturing the semiconductor products.

REFERENCES:
patent: 3494326 (1970-02-01), Upton
patent: 3559554 (1971-02-01), Schmidt
patent: 3882525 (1975-05-01), Zwettler
patent: 4032943 (1977-06-01), Zwettler
patent: 4098923 (1978-07-01), Alberti et al.

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