Surface treatment apparatus

Details Surface treatment apparatus Surface treatment apparatus

1986-08-01

1990-02-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118724, 156345, C23C 1600

Patent

active

049016679

ABSTRACT:
A surface treatment apparatus comprising a vacuum chamber, means for introducing a gas into the vacuum chamber, a gas furnace for heating and activating the gas while it is being introduced, apertures for injecting the heated gas, and a substrate stage for holding a substrate of which the surface is to be treated by the injected gas. The gas that is heated and activated is blown onto the surface of the substrate to treat the surface without causing the surface to be damaged. Therefore, the apparatus can be employed very effectively for a process for producing semiconductor elements.

REFERENCES:
patent: 2551389 (1951-05-01), Oliver
patent: 3517643 (1970-06-01), Goldstein
patent: 3785853 (1974-01-01), Kirkman
patent: 3854443 (1974-12-01), Baerg
patent: 4051382 (1977-09-01), Ogawa
patent: 4434742 (1984-03-01), Hentaff
patent: 4461783 (1984-07-01), Yamazaki
patent: 4468283 (1984-08-01), Ahmed
patent: 4522674 (1985-06-01), Ninomiya
patent: 4526805 (1985-07-01), Yoshizawa

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