Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-03-27
1981-05-05
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
156345, 204192E, 250531, C23C 1500, B01J 1900
Patent
active
042657300
ABSTRACT:
Disclosed is an apparatus for treating the surface of a material in a gas plasma generated by microwave discharge. The apparatus comprises a microwave generator, a waveguide for transmitting the microwave generated from the microwave generator, a closed vessel housing a material to be treated, means for introducing a gas into the closed vessel, means for withdrawing the gas from the closed vessel, an antenna means inserted at least partially into the closed vessel, said antenna means serving to pick up the microwave from the waveguide and to deliver said microwave into the closed vessel for producing a gas plasma, and a cylindrical body formed of a microwave-transmitting material, mounted to the closed vessel in an air-tight fashion, and surrounding the antenna means at the portion inserted into the closed vessel.
REFERENCES:
patent: 4017404 (1977-04-01), Habeger
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4101411 (1978-07-01), Suzuki et al.
patent: 4138306 (1979-02-01), Niwa
patent: 4160690 (1979-07-01), Shibagaki et al.
patent: 4175235 (1979-11-01), Niwa et al.
Akai Yoshimi
Hirose Masahiko
Tokyo Shibaura Denki K.K.
Weisstuch Aaron
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