Compositions – Fluent dielectric – N-containing
Patent
1978-07-21
1980-12-16
Herbert, Jr., Thomas J.
Compositions
Fluent dielectric
N-containing
134 42, 252547, 252548, 260404, 26050115, C11D 326, C11D 330, C11D 732
Patent
active
042396611
ABSTRACT:
A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
REFERENCES:
patent: 2676955 (1954-04-01), Weitkamp et al.
patent: 2774759 (1956-12-01), Plackett et al.
patent: 3503890 (1970-03-01), Davisson et al.
patent: 3553143 (1971-01-01), Bauer
patent: 3980587 (1976-09-01), Sullivan
The Merck Index of Chemicals and Drugs, 1960, Publ. by Merck & Co. Inc., Rahway, N.J. p. 253.
Asano Masafumi
Muraoka Hisashi
Ohashi Taizo
Shimazaki Yuzo
Herbert, Jr. Thomas J.
Tokyo Shibaura Electric Co. Ltd.
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