Etching a substrate: processes – Nongaseous phase etching of substrate – With measuring – testing – or inspecting
Patent
1995-01-31
1995-10-31
Silverberg, Sam
Etching a substrate: processes
Nongaseous phase etching of substrate
With measuring, testing, or inspecting
148272, 148275, 148626, 148667, 216101, 216103, C23C 806
Patent
active
054626340
ABSTRACT:
An aluminum material is surface-treated with an aqueous solution containing 0.005 mol/lit. or more of a chelating agent and 5 g/lit. or more of an organic amine and having 100 ppm or less of phosphoric acid radical ion concentration and 500 ppm or less of sulfuric acid radical ion concentration, until its surface has a color tone (S) of:
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Kamiyama Shiro
Kosugi Masanori
Kurata Masahiro
Sasaki Nobuyoshi
Shiraishi Sadao
Honda Giken Kogyo Kabushiki Kaisha
Silverberg Sam
Sky Aluminium Co., Ltd.
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