Surface scanning apparatus and method using crossed-cylinder opt

Details Surface scanning apparatus and method using crossed-cylinder opt Surface scanning apparatus and method using crossed-cylinder opt

1994-11-04

1996-10-15

Rosenberger, Richard A.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356431, 356398, G01N 2100, G01N 2184, G01B 908

Patent

active

055659799

ABSTRACT:
An apparatus and method for inspecting a substrate, such as a semiconductor wafer, includes crossed cylindrical optical elements that form an elliptical beam that is caused to scan in parallel fashion at an oblique angle to the substrate. Preferably, the smaller dimension of the elliptical beam is perpendicular to the direction of the scan of the beam across the wafer. A reflector converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan. On the other hand, a cylinder lens has a focusing power only in the direction perpendicular to the telecentric scanning.

REFERENCES:
patent: 4938601 (1990-07-01), Weber
patent: 5076692 (1991-12-01), Neukermans et al.
patent: 5125741 (1992-06-01), Okada et al.
patent: 5168386 (1992-12-01), Galbraith
patent: 5416594 (1995-05-01), Gross et al.

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