Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-11-19
1995-05-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430286, 430287, G03F 7012
Patent
active
054159687
ABSTRACT:
A solution containing a low-temperature curing type organosilicon ladder resin composition comprising: (A) a polylphenysylsesquioxane which has a hydroxyl group at the end, in which 3% of the side chain consists of vinyl groups, and which has a weight-average molecular weight of 150,000; (B) 1.8 wt % of 3,3'-diazidophenylsulfone based on the polylphenysylsesquioxane (A); and (C) methoxybenzene which is added to the polylphenysylsesquioxane (A) so that the polylphenysylsesquioxane content is about 15 wt % is used as the material for a surface protective film of a color filter for a light-receiving element or a display element.
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Electronic Material, pp. 53-60, Dec. 1988.
Adachi Hiroshi
Shigeyuki Yamamoto
Bowers Jr. Charles L.
Chu John S.
Mitsubishi Denki & Kabushiki Kaisha
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