Surface profile measuring method

Details Surface profile measuring method Surface profile measuring method

2006-07-14

2008-12-30

Wachsman, Hal D (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Measured signal processing

C702S166000, C702S167000, C356S511000, C356S512000

Reexamination Certificate

active

07472042

ABSTRACT:
A surface profile measuring method using a broad bandwidth light source illuminating a sample surface and a reference surface through a splitter is provided. By changing a distance between the sample surface and the reference surface with a constant step, an interference diagram with a waveform composed of interference data points depicting a relationship of surface height versus illumination intensity is generated. In the beginning, a first data point with greatest illumination intensity is selected from the interference data points on the waveform. Then, a second data point is selected from the data points on the waveform within a predetermined range centered at the first data point to have the waveform showing best quality of symmetry. Then, a peak of a fringe defined by the second data point and its neighboring data points is estimated by using phase compensating approach.

REFERENCES:
patent: 6552806 (2003-04-01), Swinford et al.
patent: 7283250 (2007-10-01), Schmit et al.
patent: 7321431 (2008-01-01), De Groot
patent: 2007/0097380 (2007-05-01), De Groot et al.
patent: 513552 (2002-12-01), None

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