Surface processing apparatus using neutral beam

Details Surface processing apparatus using neutral beam Surface processing apparatus using neutral beam

1993-08-25

1995-10-31

Chaudhuri, Olik

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 71, C23F 102

Patent

active

054626293

ABSTRACT:
A surface processing apparatus and a dry etching method using a neutral beam. The surface processing apparatus comprises a plasma chamber for generating a plasma P, a neutralizing chamber for converting an ion beam extracted from the plasma P by an ion extracting electrode into the neutral beam, and a processing chamber for introducing therein the neutral beam and etching a substrate S to be processed using the neutral beam. There is also provided a static electric field lens comprising two spaced first electrodes provided on the inner periphery of the neutralizing chamber and a second electrode interposed therebetween so as to obtain the neutral beams having low energy and high flux.

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