Surface processing apparatus

Details Surface processing apparatus Surface processing apparatus

1997-11-19

1999-10-05

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723MW, 20429838, H05H 100

Patent

active

059617764

ABSTRACT:
A surface processing apparatus includes a microwave generator which generates low UHF band microwaves of from 300 MHz to 1 GHz, a cavity resonator in which the microwaves generated in the microwave generator resonate in the TM 010 mode, an airtight process chamber which is connected to the cavity resonator, a radiation plate which is arranged in a part of the cavity resonator which is connected with the process chamber, the radiation plate has a plurality of radiation holes which are established symmetrically with respect to a central axis of the cavity resonator, and cover plates made of a dielectric material which close off the radiation holes in an airtight manner.

REFERENCES:
patent: 4985109 (1991-01-01), Otsubo et al.
patent: 5698036 (1997-12-01), Ishii et al.

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