Surface preparation for receiving processing treatments

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S054000, C451S056000, C451S060000

Reexamination Certificate

active

06988936

ABSTRACT:
A solution for rinsing a surface that has been planarized using a chemical-mechanical planarization (“CMP”) technique. The solution may be a surfactant solution introduced following the use of a polishing solution in the CMP technique. The surfactant solution acts to clear undesirable particles from the planarized surface and also can terminate “latent” effects from the polishing solution. A cleaning solution is generally injected after the rinsing solution for additional cleaning effects. A plate covered with a textured material such a fabric is usually applied to the surface during the polishing, rinsing, or cleaning steps.

REFERENCES:
patent: 5571373 (1996-11-01), Krishna et al.
patent: 5578529 (1996-11-01), Mullins
patent: 5702563 (1997-12-01), Salugsugan et al.
patent: 5755614 (1998-05-01), Adams et al.
patent: 5958298 (1999-09-01), Nagoshi et al.
patent: 5961377 (1999-10-01), Jeong
patent: 5996594 (1999-12-01), Roy et al.
patent: 6149508 (2000-11-01), Vanell et al.
patent: 6213853 (2001-04-01), Gonzalez-Martin et al.
patent: 6336945 (2002-01-01), Yamamoto et al.
patent: 6638145 (2003-10-01), Hall et al.
patent: 6716089 (2004-04-01), Sharples et al.
Exploring Material Engineering-Semiconductor Materials http://www-engr.sjsu.edu/WofMatE/Semiconductors.htm.
Michael L. Free, XP-002266271, “Using Surfactants in iron-based CMP slurries to minimize residual particles”, Surface Chemistries, Micromagazine (1998).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Surface preparation for receiving processing treatments does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Surface preparation for receiving processing treatments, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Surface preparation for receiving processing treatments will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3560914

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.