Surface position measuring method, exposure apparatus, and...

Details Surface position measuring method, exposure apparatus, and... Surface position measuring method, exposure apparatus, and...

2008-01-01

2008-01-01

Fulton, Christopher W (Department: 2859)

Geometrical instruments

Gauge

Collocating

C257S797000, C438S401000, C356S400000

Reexamination Certificate

active

07313873

ABSTRACT:
A surface position measuring method wherein measurement light is obliquely projected onto a substrate surface and on the basis of a position of the detected measurement light and a predetected offset, the position of the substrate surface with respect to a direction of an optical axis of the projection optical system is measured, memorizing a first position of a point on the substrate while using a reference mark provided on a substrate stage, measuring the position of the measurement light as a first measurement position; rotating the substrate by 180 deg. in a plane perpendicular to the optical axis; memorizing a second position of the measurement point on the rotated substrate with reference to the reference mark; measuring the position of the measurement light as a second measurement position; and detecting of the offset at the measurement point on the basis of the first and second measurement position.

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