Surface pattern unevenness detecting method and apparatus

Details Surface pattern unevenness detecting method and apparatus Surface pattern unevenness detecting method and apparatus

1998-07-15

1999-11-23

Pham, Hoa Q.

Optics: measuring and testing

By polarized light examination

With light attenuation

3562372, 356446, G01B 1130

Patent

active

059910380

ABSTRACT:
The present invention provides an apparatus and associated method of detecting pattern unevenness in the surface of an object. The apparatus includes a light source for irradiating surfaces of an object and a line sensor camera for detecting unevenness in the surfaces. The method comprises the steps of irradiating a light onto a surface having a pattern formed on the surface thereof, and observing the scattered light from the pattern edge portions, thereby inspecting pattern unevenness by way of the line sensor camera.

REFERENCES:
patent: 4954723 (1990-09-01), Takahashi et al.
patent: 4983842 (1991-01-01), Takamine
patent: 5264912 (1993-11-01), Vaught et al.
patent: 5763123 (1998-06-01), Shishido et al.

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