Plastic and nonmetallic article shaping or treating: processes – Optical article shaping or treating – Including step of mold making
Reexamination Certificate
2007-11-13
2007-11-13
Heitbrink, Tim (Department: 1722)
Plastic and nonmetallic article shaping or treating: processes
Optical article shaping or treating
Including step of mold making
C264S001330, C264S130000, C264S134000, C264S338000, C264S220000, C425S093000, C425S107000, C425S403000, C425S810000
Reexamination Certificate
active
09972159
ABSTRACT:
A method of performing imprint lithography of a surface substrate includes a stamper having a thin lubricant coating thereon to facilitate release of the stamper from the imprinted surface to reduce degradation of image replication. Embodiments of the invention include stampers suitable for use in patterning servo information on magnetic recording media having a lubricant coating of from about 1 nm to about 20 nm.
REFERENCES:
patent: 3565978 (1971-02-01), Folger et al.
patent: 3842194 (1974-10-01), Clemens
patent: 4188240 (1980-02-01), Yoshio
patent: 4252848 (1981-02-01), Datta et al.
patent: 4482511 (1984-11-01), Komatsubara
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4938995 (1990-07-01), Giordano et al.
patent: 5112025 (1992-05-01), Nakayama et al.
patent: 5330880 (1994-07-01), Horigome et al.
patent: 5503963 (1996-04-01), Bifano
patent: 5663127 (1997-09-01), Flynn et al.
patent: 5772905 (1998-06-01), Chou
patent: 5817242 (1998-10-01), Biebuyck et al.
patent: 5853506 (1998-12-01), Meldrum
patent: 5958651 (1999-09-01), van Hoof et al.
patent: 6027595 (2000-02-01), Suleski
patent: 6049656 (2000-04-01), Kim et al.
patent: 6117284 (2000-09-01), Mueller
patent: 6127017 (2000-10-01), Hirata et al.
patent: 6165911 (2000-12-01), Calveley
patent: 6168845 (2001-01-01), Fontana, Jr. et al.
patent: 6190838 (2001-02-01), Kerfeld
patent: 6190929 (2001-02-01), Wang et al.
patent: 6197399 (2001-03-01), Naito et al.
patent: 6228294 (2001-05-01), Lee et al.
patent: 6242831 (2001-06-01), Khan
patent: 6403149 (2002-06-01), Parent et al.
patent: 6517995 (2003-02-01), Jacobson et al.
patent: 6653057 (2003-11-01), Koyama
patent: 03-039239 (1991-02-01), None
patent: 08-240654 (1996-09-01), None
H. Schulz, F. Osenberg, J. Engemann, and H.C. Scheer, “Mask Fabrication By Nanoimprint Lithography Using Anti-Sticking Layers,” Proc. SPIE vol. 3396, pp. 244-249, 16th European Conference On Mask Technology For Integrated Circuits And Microcomponents, Uwe F. Behringer, Ed., Feb. 2000.
P. Gröning, A. Schneuwly, L. Schlapbach, and M.T. Gale, “‘Self-Thickness-Limited’ Plasma Ploymerization Of An Ultrathin Antiadhesive Film”, J. Vac. Sci. Technol. A 14(6), Nov./Dec. 1996, pp. 3043-3048.
Gauzner Gennady
Wago Koichi
Heitbrink Tim
Nguyen Thu Khanh T.
Seagate Technology LLC
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