Surface modification of medical implants

Details Surface modification of medical implants Surface modification of medical implants

1998-01-16

2000-03-07

Gulakowski, Randy

Etching a substrate: processes

Etching and coating occur in the same processing chamber

216 67, 216 77, 20419232, 20419235, B44C 122

Patent

active

060335823

ABSTRACT:
An irregularly etched medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 .mu.m to less than about 20 .mu.m in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties are obtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.

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