Surface-micromachined symmetrical differential pressure sensor w

Measuring and testing – Fluid pressure gauge – Diaphragm

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Details

73724, 3612833, 3612834, G01L 912

Patent

active

056799020

ABSTRACT:
The invention is related to a symmetrical capacitive differential pressure sensor formed by depositing onto a substrate (1) using the surface-micromachining methods of semiconductor device manufacturing technology. The sensor comprises the following, entirely from each other electrically insulated thin-film layers: an at least partially conducting sensing diaphragm (5) made from polysilicon and conducting counterelectrodes (3 and 7) adapted to both sides of the sensing diaphragm (5). According to the invention, said counter-electrodes (3 and 7) are made from polysilicon thin film and comprise at least one electrically conducting area.

REFERENCES:
patent: 5316619 (1994-05-01), Mastrangelo

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