Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2007-07-06
2009-11-10
Lauchman, L. G (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
C356S239700, C356S239800, C356S237200
Reexamination Certificate
active
07616299
ABSTRACT:
When measuring an edge region, a photo detector with an angle not influenced by the diffracted light, the diffracted light causing noise, is selected to thereby allow for inspection that minimizes the sensitivity reduction. This allows for the management of foreign matters in the outer peripheral portion, which conventionally could not be measured, and this also eliminates the oversight of critical defects on the wafer, thus leading to reduction of failures of IC.
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Mitomo Kenji
Okawa Takashi
Hitachi High-Technologies Corporation
Lauchman L. G
McDermott Will & Emery LLP
Underwood Jarreas C
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