Surface inspection method and surface inspection apparatus

Details Surface inspection method and surface inspection apparatus Surface inspection method and surface inspection apparatus

2011-03-29

2011-03-29

Pham, Hoa Q (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237300

Reexamination Certificate

active

07916287

ABSTRACT:
Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

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