Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Patent
1998-04-13
1999-10-26
Pham, Hoa Q.
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
356400, 355 53, G01N 2100
Patent
active
059737760
ABSTRACT:
A device enabling an inspector to inspect a surface of a photomask etc. without holding the photomask manually, and enabling him/her not to lose his/her sight of any defect of the surface even if the surface is tilted. The device includes a hemispherical support, with its open side upward, which is supported so as to slidably move along a spherical surface with a point S as its center, an X-Y stage which is fixed onto the hemispherical support, a rotation unit which is mounted onto the X-Y stage, a support plate which is supported onto the rotation unit, a lighting device which lights up a part of a photomask, on the support plate, corresponding to the spot S and its vicinity. The support plate can be tilted about the spot S.
REFERENCES:
patent: 4902900 (1990-02-01), Kamiya et al.
patent: 5066131 (1991-11-01), Iwata et al.
patent: 5461237 (1995-10-01), Wakamoto et al.
patent: 5717482 (1998-02-01), Akutsu et al.
patent: 5737063 (1998-04-01), Miyachi
patent: 5831739 (1998-11-01), Ota
patent: 5850291 (1998-12-01), Tsutsui
Matsushita Seiki Co., Ltd.
Pham Hoa Q.
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