Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-02-08
1992-01-14
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 50, 118720, 118729, 20429825, C23C 1434
Patent
active
050807749
ABSTRACT:
In a device for vacuum coating of a sheet such as a glass plate, especially by reactive cathode sputtering, with a film made from a semiconductor, a metal oxide or another metal compound, the parts within the coating chamber adjacent to the sheet (2) which are exposed to a particle stream coming from cathode (4) for example, screen or shielding plates (10), electrodes (8) and/or shielding plates (12), are provided with end areas (10') and/or protrusions that are shaped like a knife edge. Such an edge has been found to promote cracking along the edge which relieves stresses and reduces chipping and resultant damage to the coating being deposited on that sheet.
REFERENCES:
patent: 3514391 (1970-05-01), Hallanian et al.
patent: 3945911 (1976-03-01), McKelvey
patent: 4100055 (1978-07-01), Rainey
patent: 4313815 (1982-02-01), Graves, Jr. et al.
patent: 4427524 (1984-01-01), Crombeen et al.
patent: 4545882 (1985-10-01), McKelvey
patent: 4699702 (1987-10-01), Minakata et al.
John L. Vossen et al, Thin Film Processes, Academic Press, New York, 1978, pp. 13, 32.
Leader William T.
Niebling John
Saint-Gobain Vitrage
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