Optics: measuring and testing – Of light reflection – With diffusion
Patent
1982-08-03
1986-04-22
Rosenberger, R. A.
Optics: measuring and testing
Of light reflection
With diffusion
356448, G01N 2147
Patent
active
045838615
ABSTRACT:
A parallel light beam having a predetermined diameter is projected onto an aluminum deposition film formed on a semiconductor wafer in a direction normal to the wafer surface. Light reflected by the aluminum deposition film is converted into reflected light intensity data by a plurality of photoelectric conversion elements arranged in a spherical surface with the center thereof at the center of the parallel light beam incidence spot. The reflected light intensity data are stored in a RAM in a microprocessor. The data stored in the RAM are displayed as a reflected light intensity distribution plot on a display unit for comparison with a standard reflected light intensity distribution plot, whereby the bonding property of the aluminum deposition film is judged.
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Ogawa Shigeru
Okumura Katsuya
Yamaji Hiroshi
Rosenberger R. A.
Tokyo Shibaura Denki Kabushiki Kaisha
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