Surface condition inspection method and apparatus using image tr

Details Surface condition inspection method and apparatus using image tr Surface condition inspection method and apparatus using image tr

1991-01-24

1992-11-10

McGraw, Vincent P.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356394, G01N 2188

Patent

active

051628678

ABSTRACT:
An optical unit for inspecting the state of latent images or photochromic images on a wafer is mounted on an exposure apparatus. Before actually printing images on a product wafer, a reticle pattern is printed on the wafer using a wafer on which a resist for development is coated or a photochromic film for forming photochromic images is formed. Latent images or photochromic images of the reticle pattern thus obtained are inspected by the inspection unit. According to the result of inspection, it is determined whether or not any foreign particle of a level that would affect printing is present on the reticle.

REFERENCES:
patent: 4330775 (1982-05-01), Iwamoto et al.
patent: 4586822 (1986-05-01), Tanimoto
patent: 4718767 (1988-01-01), Hazama
patent: 4758094 (1988-07-01), Wihl et al.
patent: 4875076 (1989-10-01), Torigoe et al.

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