Surface coating method to highlight transparent mask defects

Details Surface coating method to highlight transparent mask defects Surface coating method to highlight transparent mask defects

1999-01-04

2000-08-29

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061106232

ABSTRACT:
A method for detection of a photomask defect. The method comprises the steps of applying a contrast-enhancing coating on the photomask and optically inspecting the photomask for defects. The contrast-enhancing coating may be copper, aluminum, molybdenum silicide, or any material capable of altering the reflectivity or transmissivity of defects.

REFERENCES:
patent: 4725139 (1988-02-01), Hack et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5650854 (1997-07-01), Sugawara
patent: 5795685 (1998-08-01), Liebmann et al.

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